Skip to main content

EN
ÍS

Forsíða

Forsíða

Jón Tómas Guðmundsson - Professor

Default image of a person

–

School of Engineering and Natural Sciences

Jón Tómas Guðmundsson

Professor

Location
VR-3 / V03-213
Phone
525 - 4946
Email
tumi [at] hi.is

Unit
Faculty of Physical Sciences
Website
http://www.raunvis.hi.is/~tumi

Published works

2024

Role of sputtered atom and ion energy distribution in films deposited by physical vapor depositionJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Probing trade-off between critical size and velocity in cold-prayJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
On working gas rarefaction in high power impulse magnetron sputteringPlasma Sources Science and Technology
Laboratory realization of relativistic pair-plasma beamsNature Communications
High power impulse magnetron sputtering of a zirconium targetJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine dischargePlasma Sources Science and Technology

2023

Insights into the copper HiPIMS dischargePlasma Sources Science and Technology
Influence of the magnetic field on the extension of the ionization region in high power impulse magnetron sputtering dischargesPlasma Sources Science and Technology
Epitaxial growth and characterization of (001) [NiFe/M]₂₀ (M = Cu, CuPt and Pt) superlatticesSurfaces and Interfaces
Target ion and neutral spread in high power impulse magnetron sputteringJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering dischargesJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Field reversal in low pressure, unmagnetized radio frequency capacitively coupled argon plasma dischargesApplied Physics Letters
Inductively-coupled plasma discharge for use in high-energy-density science experimentsJournal of Instrumentation
On the importance of excited state species in low pressure capacitively coupled plasma argon dischargesPlasma Sources Science and Technology
High power impulse magnetron sputtering of tungstenPlasma Sources Science and Technology

2022

Surface effects in a capacitive argon discharge at intermediate pressure
Surface effects in a capacitive argon discharge in the intermediate pressure regimePlasma Sources Science and Technology
Ionization region model of high power impulse magnetron sputtering of copperSurface and Coatings Technology
Particle-in-Cell Simulations With Fluid Metastable Atoms in Capacitive Argon DischargesIEEE Transactions on Plasma Science
Operating modes and target erosion in high power impulse magnetron sputteringJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Modeling of high power impulse magnetron sputtering discharges with tungsten targetPlasma Sources Science and Technology
On the population density of the argon excited levels in a high power impulse magnetron sputtering dischargePhysics of Plasmas
Foundations of physical vapor deposition with plasma assistancePlasma Sources Science and Technology

2021

Tailoring interface alloying and magnetic properties in (111) Permalloy/Pt multilayersJournal of Magnetism and Magnetic Materials
Generating ultradense pair beams using 400 GeV/c protonsPhysical Review Research
Tailoring interface alloying and magnetic properties in (111) Permalloy/Pt multilayersJournal of Magnetism and Magnetic Materials
On the deposition rate and ionized flux fraction in high power impulse magnetron sputtering (HiPIMS) Proceedings of the 64th Society of Vacuum Coaters Annual Technical Conferenece
On how to measure the probabilities of target atom ionization and target ion back-attraction in high-power impulse magnetron sputteringJournal of Applied Physics
Electron power absorption in radio frequency driven capacitively coupled chlorine dischargePlasma Sources Science and Technology
On the role of ion potential energy in low energy HiPIMS depositionSurface and Coatings Technology
HiPIMS optimization by using mixed high-power and low-power pulsingPlasma Sources Science and Technology
Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering dischargeJournal of Physics D: Applied Physics
Benchmarked and upgraded particle-in-cell simulations of a capacitive argon discharge at intermediate pressurePlasma Sources Science and Technology
On the electron energy distribution function in the high power impulse magnetron sputtering dischargePlasma Sources Science and Technology
Photoluminescence study of Si_1-xGe_xnanoparticles in various oxide matrices
Modeling of high power impulse magnetron sputtering discharges with graphite targetPlasma Sources Science and Technology

2020

Obtaining SiGe nanocrystallites between crystalline TiO₂ layers by HiPIMS without annealingApplied Surface Science
Structural and photoluminescence study of TiO2 layer with self-assembled Si1-xGex nanoislandsJournal of Applied Physics
Effect of substrate bias on microstructure of epitaxial film grown by HiPIMSJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Obtaining SiGe nanocrystallites between crystalline TiO₂ layers by HiPIMS without annealingApplied Surface Science
Electron power absorption dynamics in a low pressure radio frequency driven capacitively coupled discharge in oxygenJournal of Applied Physics
Tailored voltage waveforms applied to a capacitively coupled chlorine dischargePlasma Sources Science and Technology
Optimizing the deposition rate and ionized flux fraction by tuning the pulse length in high power impulse magnetron sputteringPlasma Sources Science and Technology
Optimization of HiPIMS dischargesJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Collisionless electron cooling in a plasma thruster plumePlasma Sources Science and Technology
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputteringJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Physics and technology of magnetron sputtering dischargesPlasma Sources Science and Technology
Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulationJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Study of the transition from self-organised to homogeneous plasma distribution in chromium HiPIMS dischargeJournal of Physics D: Applied Physics
Tailoring microstructure and stress through energetic ion bombardment: A molecular dynamic simulation
The importance of HiPIMS ionization flux fraction on the film microstructure and surface roughness: A molecular dynamic simulation

2019

Role of ionization fraction on the surface roughness, density, and interface mixing of the films deposited by thermal evaporation, dc magnetron sputtering, and HiPIMSJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electron heating mode transitions in a low pressure capacitively coupled oxygen dischargePlasma Sources Science and Technology
Effect of atomic ordering on the magnetic anisotropy of single crystal Ni80Fe20AIP Advances
Enhanced photoconductivity of embedded SiGe nanoparticles by hydrogenationApplied Surface Science
Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO₂ matrixNanotechnology
Electron dynamics in high power impulse magnetron sputtering discharges
Modeling the high power impulse magnetron sputtering discharge
A global model study of low pressure high density CF₄ dischargePlasma Sources Science and Technology
Hardware and power management for high power impulse magnetron sputtering
High power impulse magnetron sputtering
Heavy species dynamics in high power impulse magnetron sputtering discharges
Reactive high power impulse magnetron sputtering
The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS DischargeJournal of Plasma Physics
Preface
Oblique angle deposition of nickel thin films by high-power impulse magnetron sputteringBeilstein Journal of Nanotechnology
Introduction to magnetron sputtering
Fabrication and characterization of Si1-xGex nanocrystals in as-grown and annealed structures: A comparative studyBeilstein Journal of Nanotechnology
Physics of high power impulse magnetron sputtering discharges
Enhanced photoconductivity of SiGe nanocrystals in SiO ₂ driven by mild annealingApplied Surface Science

2018

Enhanced Photoconductivity of SIGE-Trilayer Stack by Retrenching Annealing Conditions
Growth of HfN thin films by reactive high power impulse magnetron sputteringAIP Advances
On three different ways to quantify the degree of ionization in sputtering magnetronsPlasma Sources Science and Technology
On recycling in high power impulse magnetron sputtering dischargesESCAMPIG XXIV
Effect of substrate bias on properties of HiPIMS deposited vanadium nitride filmsThin Solid Films
The Influence of Secondary Electron Emission and Electron Reflection on a Capacitively Coupled Oxygen DischargeAtoms
The frequency dependence of the discharge properties in a capacitively coupled oxygen dischargePlasma Sources Science and Technology
The Effect of H ₂ /Ar Plasma Treatment over Photoconductivity of Sige Nanoparticles Sandwiched between Silicon Oxide Matrix
Comparison of magnetic and structural properties of permalloy Ni₈₀Fe₂₀ grown by dc and high power impulse magnetron sputteringJournal of Physics D: Applied Physics
The role of surface quenching of the singlet delta molecule in a capacitively coupled oxygen dischargePlasma Sources Science and Technology
Non-Maxwellian electron energy probability functions in the plume of a SPT-100 Hall thrusterPlasma Sources Science and Technology
The influence of the electrode surfaces on the electron heating in capacitively coupled oxygen dischargeESCAMPIG XXIV
The Effect of H$_2$/Ar Plasma Treatment Over Photoconductivity of SiGe Nanoparticles Sandwiched Between Silicon Oxide MatrixProceedings of the 2018 International Semiconductor Conference

2017

On the role of metastable states in low pressure oxygen discharges
On singlet metastable states, ion flux and ion energy in single and double frequency capacitively coupled oxygen dischargesJournal Physics D: Applied Physics
Experimental Determination of the Plasma Properties in the Far-plume of an SPT-100 Hall ThrusterProceedings of the 35th International Electric Propulsion Conference
Model and Experimental validation of spacecraft-thruster Interactions for electric propulsion thrusters plumesProceedings of the 35th International Electric Propulsion Conference
The effect of singlet metastable states on the ion energy distribution in capacitively coupled oxygen dischargesProceedings of the 23rd International Symposium on Plasma Chemistry
Vanadium and vanadium nitride thin films grown by high power impulse magnetron sputteringJournal of Physics D: Applied Physics
A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetronsPlasma Sources Science and Technology
On electron heating in a low pressure capacitively coupled oxygen dischargeJournal of Applied Physics
Preface to Special TopicJournal of Applied Physics
Particle-balance models for pulsed sputtering magnetronsJournal of Physics D: Applied Physics
A study of the oxygen dynamics in a reactive Ar/O₂ high power impulse magnetron sputtering discharge using an ionization region modelJournal of Applied Physics
Foundations of DC plasma sourcesPlasma Sources Science and Technology
Influence of preparation conditions on structure and photosensing properties of GeSi/TiO₂ multilayers

2016

An ionization region model of the reactive Ar/O₂ high power impulse magnetron sputtering dischargePlasma Sources Science and Technology
The role of Ohmic heating in dc magnetron sputteringPlasma Sources Science and Technology
The role of the metastable O₂(b¹Σ⁺_g) and energy-dependent secondary electron emission yields in capacitively coupled oxygen dischargesPlasma Sources Science and Technology

2015

A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge
On the formation and annihilation of the singlet molecular metastables in an oxygen dischargeJournal of Physics D: Applied Physics
A volume averaged global model study of the influence of the electron energy distribution and the wall material on an oxygen dischargeJournal of Physics D: Applied Physics
On reactive high power impulse magnetron sputteringPlasma Physics and Controlled Fusion
On the role of metastables in capacitively coupled oxygen dischargesPlasma Sources Science and Technology
Are the argon metastables important in high power impulse magnetron sputtering discharges?Physics of Plasmas
Morphology of tantalum nitride thin films grown on fused quartz by reactive high power impulse magnetron sputtering (HiPIMS)
Dual-frequency capacitively coupled chlorine dischargePlasma Sources Science and Technology
The pressure dependence of the discharge properties in a capacitively coupled oxygen dischargeJournal of Applied Physics

2014

On the road to self-sputtering in high power impulse magnetron sputteringPlasma Sources Science and Technology
A current driven capacitively coupled chlorine dischargePlasma Sources Science and Technology
Ion energy and angular distributions in a dual-frequency capacitively coupled chlorine dischargeIEEE Transactions on Plasma Science

2013

Nýgengi og meðferð utanlegsþykktar á Íslandi 2000-2009Laeknabladid
The properties of TiN ultra-thin films grown on SiO₂ substrate by reactive high power impulse magnetron sputtering under various growth anglesThin Solid Films
Rutile TiO₂ thin films grown by reactive high power impulse magnetron sputteringThin Solid Films
On sheath energization and Ohmic heating in sputtering magnetronsPlasma Sources Science and Technology
Reactive high power impulse magnetron sputteringProceedings of the 12th International Symposium on Sputtering and Plasma Processes
Ultra-thin poly-crystalline TiN films grown by HiPIMS on MgO(100) - In-situ resistance study of the initial stage of growthThin Solid Films
A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine dischargePlasma Science and Technology
A benchmark study of a capacitively coupled oxygen discharge of the oopd1 particle-in-cell Monte Carlo codePlasma Sources Science and Technology

2012

Growth of TiO ₂ thin films on Si(001) and SiO ₂ by reactive high power impulse magnetron sputtering
Comparing resonant photon tunneling via cavity modes and Tamm plasmon polariton modes in metal-coated Bragg mirrorsOptics Letters
Comparison of TiN thin films grown on SiO ₂ by reactive dc magnetron sputtering and high power impulse magnetron sputtering
Nucleation and resistivity of ultrathin TiN films grown by high-power impulse magnetron sputteringIEEE Electron Device Letters
The influence of the electron energy distribution on the low pressure chlorine dischargeVacuum
High power impulse magnetron sputtering dischargeJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Current-voltage-time characteristics of the reactive Ar/O ₂ high power impulse magnetron sputtering dischargeJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulsesPlasma Sources Science and Technology

2011

Growth of TiO2 thin films on Si(001) and SiO2 by reactive high powerMaterials Research Society Symposium - Proceedings
An ionization region model for high-power impulse magnetron sputtering dischargesPlasma Sources Science and Technology
Current-voltage-time characteristics of the reactive Ar/N-2 high power impulse magnetron sputtering dischargeJournal of Applied Physics
Growth and in-situ electrical characterization of ultrathin epitaxial TiN films on MgOThin Solid Films
Current-voltage-time characteristics in a reactive Ar/N2 high power impulse magnetron sputtering dischargeProceedings of the XXX International Conference on Phenomena in Ionized Gases
Ar⁺ and Xe⁺ velocities near the presheath-sheath boundary in an Ar/Xe dischargePhysical Review Letters
Current-voltage-time characteristics of the reactive Ar/N2 high power impulse magnetron sputtering dischargeJournal of Applied Physics
Morphology of TiN thin films grown on SiO₂ by reactive high power impulse magnetron sputteringThin Solid Films
Comparison of TiN thin films grown on SiO2 by reactive dc magnetron sputtering and high power impulse magnetronMaterials Research Society Symposium - Proceedings
Current-voltage-time characteristics of the reactive Ar/N₂ high power impulse magnetron sputtering dischargeJournal of Applied Physics

2010

Low pressure hydrogen discharges diluted with argon explored using a global modelPlasma Sources Science and Technology
Morphology of TiN thin films grown on MgO(001) by reactive dc magnetron sputteringJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The low pressure Cl₂/O₂ discharge and the role of ClOPlasma Sources Science and Technology
A global (volume averaged) model of a Cl2/Ar discharge: II. Pulsed Power ModulationJournal Physics D: Applied Physics
A global (volume averaged) model of a chlorine dischargePlasma Sources Science and Technology
A global (volume averaged) model of a Cl₂/Ar dischargeJournal of Physics D: Applied Physics
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition toolVacuum
The effect of hydrogenation on the minority carrier lifetime in low grade siliconPhysica Scripta
Effect of hydrogenation on minority carrier lifetime in low-grade siliconPhysica Scripta T
On the film density using high power impulse magnetron sputteringSurface and Coatings Technology

2009

On the electron energy in the high power impulse magnetron sputtering dischargeJournal of Applied Physics
A global (volume averaged) model of the nitrogen discharge: II. Pulsed Power ModulationPlasma Sources Science and Technology
Electrical and structural properties of ultrathin polycrystalline and epitaxial TiN films grown by reactive dc magnetron sputtering
A global (volume averaged) model of a nitrogen dischargePlasma Sources Science and Technology
On the reaction rates in the low pressure chlorine discharge
Langmuir probe study of the plasma parameters in the HiPIMS discharge 52nd Annual Technical Conference Proceedings
The effect of hydrogenation on photovoltaic performance of silicon thin films grown on low grade silicon substrates24th European Photovoltaic Solar Energy Conference
The spatial and temporal variation of the Electron Energy Distribution Function (EEDF) in the HiPIMS discharge
Eðlisfræði rafgasa: Nokkur grunnhugtökRAUST - Tímarit um raunvísindi og stærðfræði
In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO₂Thin Solid Films
A global (volume averaged) model of the nitrogen discharge: I. Steady StatePlasma Sources Science and Technology
Ionized Physical Vapor Deposition (IPVD): Technology and ApplicationsProceedings of the 10th International Symposium on Sputtering and Plasma Processes

2008

Growth, coalesnce and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO2Applied Surface Science
Plasma parameters in a planar dc magnetron sputtering discharge of argon and kryptonJournal of Physics: Conference Series
Digital smoothing of the Langmuir probe I-V characteristicReview of Scientific Instruments
Ionized physical vapor deposition (IPVD)Journal of Physics: Conference Series
Electrical resistivity and morphology of ultra thin pt films grown by dc magnetron sputtering on SiO₂Journal of Physics: Conference Series
Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO ₂Applied Surface Science
Sólarhlöð: Grunnhugtök og uppbyggingRAUST - Tímarit um raunvísindi og stærðfræði
Ionization mechanism in the high power impulse magnetron sputtering (HiPIMS) dischargeJournal of Physics: Conference Series
Thin film silicon for solar cell application grown from liquid phase on metallurgical grade silicon23rd European Photovoltaic Solar Energy Conference

2007

Oxygen discharges diluted with argonPlasma Sources Science and Technology
Notkun LangmuirnemaRAUST - Tímarit um raunvísindi og stærðfræði
Þunnhúðartækni við gerð kísil sólarhlaðaVerktækni - tímarit VFÍ
On the role of argon reactions in a low pressure Ar/O2 dischargeProceedings of the XXVIII International Conference on Phenomena in Ionized Gases
A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurementsReview of Scientific Instruments

2006

The High Power Impulse Magnetron Sputtering Discharge: Ionization Meachanism49th Annual Technical Conference Proceedings
Highly ionized sputter discharges for thin film fabricationBulletin of the Russian Academy of Sciences: Physics
Ionized physical vapor deposition (IPVD)Thin Solid Films
In situ resistivity measurements during growth of ultra-thin Cr_0.7Mo_0.3Thin Solid Films
Improved volume-averaged model for steady and pulsed-power electronegative dischargesJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dreifing rafeinda í tíma og rúmi í háaflpúlsaðri segulspætuRAUST - Tímarit um raunvísindi og stærðfræði
The ion energy distributions and plasma composition in a high-power impulse magnetron dischargeThin Solid Films
Plasma ignition in a grounded chamber connected to a capacitive dischargePlasma Sources Science and Technology
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering dischargeThin Solid Films

2005

Ion-acoustic solitary waves in a high power pulsed magnetron sputtering dischargeJournal of Physics D: Applied Physics
Plasma dynamics in a highly ionized pulsed magnetron dischargePlasma Sources Science and Technology
High power impulse magnetron sputtering discharges and thin film growthProceedings, Annual Technical Conference - Society of Vacuum Coaters
Spatial electron density distribution in a high-power pulsed magnetron dischargeIEEE Transactions on Plasma Science
ErratumIEEE Transactions on Plasma Science
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfacesJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

2004

Preparation and characterization of magnetron sputtered, ultra-thin Cr _0.63Mo_0.37 films on MgOJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Lithium-diffused and annealed GaAsPhysical Review B - Condensed Matter and Materials Physics
Recombination and detachment in oxygen dischargesJournal of Physics D: Applied Physics
Afbrigði segulspætaRAUST - Tímarit um raunvísindi og stærðfræði
Moore's law forever and ever: The advent of nanoelectronicsProcedings of the conference: Technology in Society

2003

Impurity band in lithium-diffused and annealed GaAsPhysical Review B - Condensed Matter and Materials Physics
Frequency-dependent conductivity in lithium-diffused and annealed GaAsPhysica B: Condensed Matter
Ræktun þunnra hálfleiðandi húðaRAUST - Tímarit um raunvísindi og stærðfræði
Plasma parameters during high power pulsed sputteringProceedings of the 16th International Symposium on Plasma Chemistry
Ionization of sputtered Ti during high power pulsed magnetron sputteringProceedings of the seventh International Symposium on Sputtering and Plasma Processes
Sublingual delivery of 17β-estradiol from cyclodextrin containing tabletsPharmazie

2002

Litrófsmælingar á vetni í spanafhleðsluEðlisfræði á Íslandi
Potential fluctuations and site switching in Si-doped GaAs studied by photoluminescencePhysica Scripta T
Global model of plasma chemistry in a low-pressure O₂/F₂ dischargeJournal of Physics D: Applied Physics
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron dischargeSurface and Coatings Technology
Hopping conduction in lithium diffused and annealed GaAs
Sætasvíxl kísils í GaAsEðlisfræði á Íslandi
Potential fluctuations and siteswitching in Si-doped GaAs studied by photoluminescencePhysica Scripta

2001

The effect of Si site-switching in GaAs on electrical properties and potential fluctuationPhysica B: Condensed Matter
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron dischargeApplied Physics Letters
On the effect of the electron energy distribution on the plasma parameters of an argon dischargePlasma Sources Science and Technology
Electronegativity of low-pressure high-density oxygen dischargesJournal of Physics D: Applied Physics

2000

On the plasma parameters of a planar inductive oxygen dischargeJournal of Physics D: Applied Physics
A reply to a comment on: 'On the Plasma Parameters of a Planar Inductive Oxygen Discharge'Journal Physics D: Applied Physics
Ionized Metal Deposition for Front-end Matallization of IC's; High Power Pulsed Magnetron SputteringSelective and Functional Film Deposition Techniques
Direct observation of hydrogen passivation of nitrogen-related energy levels in ZnSe and ZnS_xSe_1-x grown by MBEJournal of Crystal Growth

1999

Experimental studies of O₂/Ar plasma in a planar inductive dischargePlasma Sources Science and Technology
Ion energy distribution in H₂/Ar plasma in a planar inductive dischargePlasma Sources Science and Technology
Veikt jónað rafgas: Kennistærðir og notkunEðlisfræði á Íslandi
Hydrogen passivation of Al_xGa_1-xAs/GaAs studied by surface photovoltage spectroscopyPhysica B: Condensed Matter
Effect of lithium diffusion on the native defects in GaAs studied by positron annihilation spectroscopyPhysica B: Condensed Matter
Women undergoing coronary angiography have less extensive coronary artery disease than men, but a similar cardiovascular death rateScandinavian Cardiovascular Journal, Supplement
Ljósörvuð yfirborðsspenna og hlutleysing veilna með vetniEðlisfræði á Íslandi
Ion energy distribution in a planar inductive oxygen dischargeJournal of Physics D: Applied Physics
Hydrogen passivation of nitrogen-related energy levels in ZnSe and ZnSSe grown by MBEPhysica B: Condensed Matter
Lithium-gold-related complexes in p-type crystalline siliconPhysica B: Condensed Matter
Hydrogenation of polysilicon thin-film transistor in a planar inductive H₂/Ar dischargeIEEE Electron Device Letters

1998

Experimental studies of H₂/Ar plasma in a planar inductive dischargePlasma Sources Science and Technology
Model and measurements for a planar inductive oxygen dischargePlasma Sources Science and Technology
Magnetic induction and plasma impedance in a planar inductive dischargePlasma Sources Science and Technology

1997

Magnetic induction and plasma impedance in a cylindrical inductive dischargePlasma Sources Science and Technology

1996

Design and in vivo testing of 17β-estradiol-HPβCD sublingual tabletsPharmazie

1992

Electrical and Optical Properties of GaAs Doped with LiMaterials Science Forum

1991

Rafmælingar á Li- íbættu GaAsEðlisfræði á Íslandi

Keywords for Specialisation:

Discharge physics

Magnetron sputtering discharges

Electrical properties of materials

Capacitively coupled discharges

Particle-in-cell

Semiconductors and semiconductor devices